Zirconium Rotating Targets
Description
Zirconium rotating targets are commonly used in the thin film deposition process in physical vapor deposition (PVD) technology, especially in vacuum evaporation and sputtering coating. In the application of rotating targets, zirconium targets improve deposition efficiency by rotating, can distribute materials more evenly, and improve the quality and adhesion of thin films. In addition, the high melting point and corrosion resistance of zirconium materials make them excellent in applications under high temperature and harsh environments.
Alfa Chemistry is a leading supplier of zirconium rotating targets with very competitive prices and unmatched customer service. We can also customize zirconium rotating targets in various sizes to suit your requirements.
General Properties
| Items | Zirconium Rotating Targets |
|---|---|
| Catalog | ACAM-OMA-A083 |
| Surface | Polished |
| Purity | 99.9% |
| Size | OD 154 x ID 125 mm |
| Length | 4000 mm (max) |
| Shape | Any other shape |
Application
Zirconium rotating targets are mainly used in thin film deposition technology, especially in physical vapor deposition (PVD) processes. Zirconium rotating targets are constantly being studied and paid attention to due to their excellent performance and diverse application potential. In practical applications, choosing the right target material and deposition process is the key to achieving high-quality thin films. The following are some specific applications of zirconium rotating targets:
- Optoelectronic devices
- Coating technology
- Electronic devices
- Optical thin films
- Touch screen
- Glass coating