W Sputtering Targets

Alfa Chemistry provides tungsten (W) sputtering targets in different specifications. W sputtering targets have the characteristics of high density, high melting point, good electrical conductivity and thermal conductivity, making them ideal materials for many applications. You can view detailed information about W sputtering targets below.
Basic Information
Items | W Sputtering Targets |
---|---|
Catalog | ACAM-ST-CM024 |
Material | Tungsten |
Symbol | W |
Color | Grayish White, Lustrous |
Thermal Conductivity (W/m·K) | 174 |
Melting Point (°C) | 3410 |
Theoretical Density (g/cc) | 19.25 |
Coefficient Of Thermal Expansion | 4.5 x 10-6/K |
Regular Size And Purity
Size | Purity |
---|---|
1.00" Diameter × 0.125" Thick | 99.95% |
1.00" Diameter × 0.250" Thick | 99.95% |
2.00" Diameter × 0.125" Thick | 99.95% |
2.00" Diameter × 0.250" Thick | 99.95% |
3.00" Diameter × 0.125" Thick | 99.95% |
3.00" Diameter × 0.250" Thick | 99.95% |
4.00" Diameter × 0.125" Thick | 99.95% |
4.00" Diameter × 0.250" Thick | 99.95% |
6.00" Diameter × 0.250" Thick | 99.95% |
8.00" Diameter × 0.125" Thick | 99.95% |
8.00" Diameter × 0.250" Thick | 99.95% |
* Some of the W sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.
Bonded Assemblies Specifications
Material | Target Size | Purity | Bonding Type | Backing Plate Size |
---|---|---|---|---|
Tungsten | 2.00" Diameter × 0.125" Thick | 99.95% | Indium | 2.00" Diameter × 0.125" Thick |
Tungsten | 2.00" Diameter × 0.125" Thick | 99.95% | Elastomer | 2.00" Diameter × 0.125" Thick |
Tungsten | 3.00" Diameter × 0.125" Thick | 99.95% | Indium | 3.00" Diameter × 0.125" Thick |
Tungsten | 3.00" Diameter × 0.125" Thick | 99.95% | Elastomer | 3.00" Diameter × 0.125" Thick |
Material Forms
In addition to round W sputtering targets, we also provide W sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
W sputtering targets have a wide range of applications due to their excellent properties, including:
- Electron tubes
- Transistors
- Integrated circuits
- Flat-panel displays
- Solar cells
- Automotive glass
- Memory
- X-ray tubes
- Medical equipment
- Smelting equipment


Alfa Chemistry specializes in the production of W sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.
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