Ni/V Sputtering Targets

Alfa Chemistry provides nickel-vanadium (Ni/V) sputtering targets in different specifications. Ni/V sputtering targets are non-magnetic and are easy to use in high-rate magnetron sputtering equipment. They are mainly used in solar energy, electronics and information industries. And they are gradually replacing pure nickel sputtering targets. Our Ni/V sputtering targets have the characteristics of high purity, uniform composition, no segregation, no pores, and uniform grain structure. They are not prone to discharge during the magnetron sputtering process, thus forming a more uniform and dense film layer. You can view detailed information about Ni/V sputtering targets below.