Al Sputtering Targets
Alfa Chemistry provides aluminum (Al) sputtering targets in different specifications. Al sputtering targets are products made of high-purity Al through a series of processes. They have good thermal stability and good electrical conductivity. Al sputtering targets are suitable for direct current (DC) diode sputtering, triode sputtering, tetrode sputtering, radio frequency sputtering, facing targets sputtering, ion beam sputtering, magnetron sputtering, etc. You can view detailed information about Al sputtering targets below.
Basic Information
| Items | Al Sputtering Targets |
|---|---|
| Catalog | ACAM-ST-CM001 |
| Material | Aluminum |
| Symbol | Al |
| Color | Silvery |
| Thermal Conductivity (W/m·K) | 235 |
| Melting Point (°C) | 660 |
| Theoretical Density (g/cc) | 2.7 |
| Coefficient Of Thermal Expansion | 23.1 x 10-6/K |
Regular Size And Purity
| Size | Purity |
|---|---|
| 1.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 1.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 1.30" Diameter × 0.250" Thick | 99.999% |
| 2.00" Diameter × 0.0625" Thick | 99.99% |
| 2.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 2.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 3.00" Diameter × 0.0625" Thick | 99.99% |
| 3.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 3.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 4.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 4.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 4.00" Diameter × 0.375" Thick | 99.999% |
| 5.00" Diameter × 0.125" Thick | 99.99% |
| 6.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 6.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 7.00" Diameter × 0.250" Thick | 99.99% |
| 8.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
* Some of the Al sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.
Material Forms
In addition to round Al sputtering targets, we also provide Al sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
Al sputtering targets have a wide range of applications, and are mainly used in the following aspects.
- Reflective films
- Conductive films
- Semiconductor films
- Capacitor films
- Decorative films
- Protective films
- Integrated circuits
- Displays
- Battery materials
- Semiconductor chips
- Medical electronic components
Alfa Chemistry specializes in the production of Al sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.
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