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Bi2O3 Sputtering Targets

Bi2O3 Sputtering Targets

Alfa Chemistry provides bismuth oxide (Bi2O3) sputtering targets in different specifications. Bi2O3 sputtering targets can be used in electronics, magnetic recording, photovoltaics and other fields. You can view detailed information about Bi2O3 sputtering targets below.

Basic Information

ItemsBi2O3 Sputtering Targets
CatalogACAM-ST-C002
MaterialBismuth Oxide
SymbolBi2O3
ColorYellow
AppearanceCrystalline Solid
Melting Point (°C)860
Theoretical Density (g/cc)8.55
Purity99.9%

* If you need Bi2O3 sputtering targets of other purities, please contact us for customization.

Regular Size

Diameter (inch)Thick (inch)
1.000.125
1.000.250
2.000.125
2.000.250
3.000.125
3.000.250
4.000.125

* Some of the Bi2O3 sputtering targets of the above sizes are in stock, and other sizes can be customized. Please send us an inquiry for more information.

Bonded Assemblies Specifications

MaterialTarget SizePurityBonding TypeBacking Plate Size
Bismuth Oxide2.00" Diameter × 0.125" Thick99.9%Indium2.00" Diameter × 0.125" Thick
Bismuth Oxide3.00" Diameter × 0.125" Thick99.9%Indium3.00" Diameter × 0.125" Thick

Material Forms

In addition to round Bi2O3 sputtering targets, we also provide Bi2O3 sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.

Alfa Chemistry focuses on the R&D and production of sputtering targets. We provide Bi2O3 sputtering targets of various specifications, and we also support target customization. If you have any questions or needs, please do not hesitate to contact us.

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