C (Pyrolytic Graphite) Sputtering Targets
Alfa Chemistry provides high-purity carbon (C) (pyrolytic graphite) sputtering targets in different specifications. Pyrolytic graphite is a new type of graphite material made by decomposing hydrocarbon gases at extremely high temperatures in a vacuum furnace. Pyrolytic graphite sputtering targets are manufactured from pyrolytic graphite via chemical vapor deposition (CVD) and grown atom by atom. They are more directional and may have the ability to sputter at higher rates. They also have excellent high temperature stability, electrical conductivity and chemical stability, and can perform well in more demanding environments. You can view detailed information about C (pyrolytic graphite) sputtering targets below.
Basic Information
| Items | C (Pyrolytic Graphite) Sputtering Targets |
|---|---|
| Catalog | ACAM-ST-NM003 |
| Material | Carbon (Pyrolytic Graphite) |
| Symbol | C |
| Color | Black |
| Appearance | Non-metallic |
| Thermal Conductivity (W/m·K) | 140 |
| Melting Point (°C) | About 3652 |
| Theoretical Density (g/cc) | 2.25 |
| Coefficient Of Thermal Expansion | 7.1 x 10-6/K |
Regular Size And Purity
| Size | Purity |
|---|---|
| 1.00" Diameter × 0.125" Thick | 99.999% |
| 1.00" Diameter × 0.250" Thick | 99.999% |
| 2.00" Diameter × 0.125" Thick | 99.999% |
| 2.00" Diameter × 0.250" Thick | 99.999% |
| 3.00" Diameter × 0.125" Thick | 99.999% |
| 3.00" Diameter × 0.250" Thick | 99.999% |
| 4.00" Diameter × 0.125" Thick | 99.999% |
| 4.00" Diameter × 0.250" Thick | 99.999% |
* Some of the C (pyrolytic graphite) sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.
Bonded Assemblies Specifications
| Material | Target Size | Purity | Bonding Type | Backing Plate Size |
|---|---|---|---|---|
| Carbon (Pyrolytic Graphite) | 2.00" Diameter × 0.125" Thick | 99.999% | Indium | 2.00" Diameter × 0.125" Thick |
| Carbon (Pyrolytic Graphite) | 3.00" Diameter × 0.125" Thick | 99.999% | Indium | 3.00" Diameter × 0.125" Thick |
| Carbon (Pyrolytic Graphite) | 3.00" Diameter × 0.125" Thick | 99.999% | Elastomer | 3.00" Diameter × 0.125" Thick |
| Carbon (Pyrolytic Graphite) | 3.00" Diameter × 0.125" Thick | 99.999% | Indium | 3.00" Diameter × 0.092" Thick |
Material Forms
In addition to round C (pyrolytic graphite) sputtering targets, we also provide C (pyrolytic graphite) sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
C (pyrolytic graphite) sputtering targets have a wide range of applications, mainly including the following aspects.
- Semiconductor devices. C (pyrolytic graphite) sputtering targets can be used to prepare semiconductor devices, including thin film transistors (TFTs) and other integrated circuit components.
- Optoelectronic devices. C (pyrolytic graphite) sputtering targets with high purity and uniform structure are suitable for the preparation of high-performance devices in the field of optoelectronics, such as lasers and photodetectors.
- Conductive films. C (pyrolytic graphite) sputtering targets can be used to prepare conductive films for coating on various substrates such as glass and plastic.
- High temperature reactor materials. The thermal stability of C (pyrolytic graphite) sputtering targets allows them to be used in the preparation of materials for high-temperature reactors, such as experimental devices in chemical reactions or high-temperature environments.
- Graphite electrodes. C (pyrolytic graphite) sputtering targets are also used to prepare graphite electrodes for electrochemical and battery applications due to their high electrical conductivity and chemical stability.
Alfa Chemistry offers a full range of C (pyrolytic graphite) sputtering targets in different sizes, purities, forms and prices. We also design sputtering targets according to customer needs. If you need anything, please feel free to contact us. At Alfa Chemistry, we are happy to serve you.
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