Cu Sputtering Targets
Alfa Chemistry provides high-purity copper (Cu) sputtering targets in different specifications. Due to the excellent thermal conductivity, electrical conductivity, and corrosion resistance of Cu sputtering targets, they have been widely used. You can view detailed information about Cu sputtering targets below.
Basic Information
| Items | Cu Sputtering Targets |
|---|---|
| Catalog | ACAM-ST-CM005 |
| Material | Copper |
| Symbol | Cu |
| Color | Metallic |
| Thermal Conductivity (W/m·K) | 400 |
| Melting Point (°C) | 1083 |
| Theoretical Density (g/cc) | 8.92 |
| Coefficient Of Thermal Expansion | 16.5 x 10-6/K |
Regular Size And Purity
| Size | Purity |
|---|---|
| 1.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 1.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 2.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 2.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 3.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 3.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 4.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 4.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 5.00" Diameter × 0.250" Thick | 99.99% |
| 6.00" Diameter × 0.0625" Thick | 99.995% |
| 6.00" Diameter × 0.125" Thick | 99.99%, 99.999% |
| 6.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
| 8.00" Diameter × 0.125" Thick | 99.999% |
| 8.00" Diameter × 0.250" Thick | 99.99%, 99.999% |
* Some of the Cu sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.
Material Forms
In addition to round Cu sputtering targets, we also provide Cu sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
Cu sputtering targets can be used in a variety of fields, including:
- Optical field. Cu sputtering targets have important applications in the optical field. They can be used to prepare various optical film materials, such as metal films, reflective films, etc.
- Electronic field. In the electronic field, Cu sputtering targets are widely used to prepare semiconductor thin film materials. In addition, they are also used to prepare conductive films, capacitor electrode films, resistive films, etc.
- Medical field. Cu sputtering targets can be used to prepare X-ray targets in medical imaging equipment. Cu sputtering targets have high density and good thermal conductivity, which can meet the requirements of X-ray generation.
- Energy field. In the energy field, Cu sputtering targets also have important applications. They can be used to prepare solar cell materials.
- Aerospace field. Cu sputtering targets have good thermal conductivity and oxidation resistance, and can be used to prepare thermal conductive materials for aerospace vehicles.
Alfa Chemistry specializes in the production of Cu sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.
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