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Hf Sputtering Targets

Hf Sputtering Targets

Alfa Chemistry provides high-quality hafnium (Hf) sputtering targets in different specifications. Hf sputtering targets have good thermal conductivity, mechanical strength, chemical stability and corrosion resistance. They can be used to manufacture components such as electrodes, transistors, capacitors and resistors in electronic devices, and can also be used to produce optical films to improve the performance of optical instruments and devices. You can view detailed information about Hf sputtering targets below.

Basic Information

ItemsHf Sputtering Targets
CatalogACAM-ST-CM011
MaterialHafnium
SymbolHf
ColorGray
Thermal Conductivity (W/m·K)23
Melting Point (°C)2227
Theoretical Density (g/cc)13.31
Coefficient Of Thermal Expansion5.9 x 10-6/K

Regular Size And Purity

SizePurity
1.00" Diameter × 0.125" Thick99.9%
1.00" Diameter × 0.250" Thick99.9%
2.00" Diameter × 0.125" Thick99.9%
2.00" Diameter × 0.250" Thick99.9%
3.00" Diameter × 0.125" Thick99.9%
3.00" Diameter × 0.250" Thick99.9%
4.00" Diameter × 0.125" Thick99.9%
4.00" Diameter × 0.250" Thick99.9%
6.00" Diameter × 0.125" Thick99.9%
6.00" Diameter × 0.250" Thick99.9%
8.00" Diameter × 0.125" Thick99.9%
8.00" Diameter × 0.250" Thick99.9%

* Some of the Hf sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.

Material Forms

In addition to round Hf sputtering targets, we also provide Hf sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.

Alfa Chemistry specializes in the production of Hf sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.

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