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Mn/Ir Sputtering Targets

Mn/Ir Sputtering Targets

Alfa Chemistry offers manganese-iridium (Mn/Ir) sputtering targets in different specifications. Mn/Ir sputtering targets have high hardness, good corrosion resistance and electrical conductivity, and have important applications in optics, electronics, aerospace and other fields. You can view detailed information about Mn/Ir sputtering targets below.

Basic Information

ItemsMn/Ir Sputtering Targets
CatalogACAM-ST-A007
MaterialManganese, Iridium

Product Parameters

Composition (Mn/Ir)SizePurity
80/20 AT%1.00" Diameter × 0.250" Thick99.9%
80/20 AT%2.00" Diameter × 0.0625" Thick99.95%
80/20 AT%2.00" Diameter × 0.125" Thick99.9%, 99.95%
78/22 AT%2.00" Diameter × 0.125" Thick99.9%, 99.95%
75/25 AT%2.00" Diameter × 0.125" Thick99.9%, 99.95%
50/50 AT%2.00" Diameter × 0.125" Thick99.9%
80/20 AT%2.00" Diameter × 0.250" Thick99.9%, 99.95%
78/22 AT%2.00" Diameter × 0.250" Thick99.95%
80/20 AT%3.00" Diameter × 0.125" Thick99.9%
75/25 AT%3.00" Diameter × 0.125" Thick99.9%, 99.95%
81/19 AT%4.00" Diameter × 0.125" Thick99.95%
78/22 AT%4.00" Diameter × 0.125" Thick99.95%
80/20 AT%4.00" Diameter × 0.250" Thick99.9%

* If you need Mn/Ir sputtering targets of other sizes or other purities or other composition ratios, please contact us for customization.

Bonded Assemblies Specifications

MaterialComposition (Mn/Ir)Target SizePurityBonding TypeBacking Plate Size
Manganese, Iridium80/20 AT%2.00" Diameter × 0.0625" Thick99.95%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium80/20 AT%2.00" Diameter × 0.125" Thick99.95%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium80/20 AT%2.00" Diameter × 0.125" Thick99.9%Elastomer2.00" Diameter × 0.092" Thick
Manganese, Iridium78/22 AT%2.00" Diameter × 0.125" Thick99.9%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium75/25 AT%2.00" Diameter × 0.125" Thick99.95%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium75/25 AT%2.00" Diameter × 0.125" Thick99.9%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium75/25 AT%2.00" Diameter × 0.125" Thick99.9%Elastomer2.00" Diameter × 0.092" Thick
Manganese, Iridium50/50 AT%2.00" Diameter × 0.125" Thick99.9%Elastomer2.00" Diameter × 0.125" Thick
Manganese, Iridium81/19 AT%4.00" Diameter × 0.125" Thick99.95%Elastomer4.00" Diameter × 0.125" Thick

Material Forms

In addition to round Mn/Ir sputtering targets, we also provide Mn/Ir sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.

Applications

  • Optics. In the field of optics, Mn/Ir sputtering targets can be used to prepare thin film coatings with high reflectivity and anti-reflective properties.
  • Electronics. In the field of electronics, Mn/Ir sputtering targets can be used to prepare thin film materials with excellent electronic properties, such as superconducting materials, semiconductor materials, etc.
  • Aerospace. In the aerospace field, Mn/Ir sputtering targets can be used to manufacture high-temperature components such as engine blades and combustion chambers.

Alfa Chemistry specializes in the research and development, production and sales of sputtering targets. We provide various research institutes and production units with high-quality Mn/Ir sputtering targets of different specifications and ratios. In addition, we also provide professional customization services. If you need Mn/Ir sputtering targets, please feel free to contact us.

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