AlN Sputtering Targets
Alfa Chemistry provides aluminum nitride (AlN) sputtering targets in different specifications. AlN sputtering targets have the characteristics of high hardness, high melting point, stable chemical properties, good electrical conductivity and excellent thermal conductivity, and are widely used in optoelectronic engineering. You can view detailed information about AlN sputtering targets below.
Basic Information
| Items | AlN Sputtering Targets |
|---|---|
| Catalog | ACAM-ST-C006 |
| Material | Aluminum Nitride |
| Symbol | AlN |
| Color | Bluish White |
| Appearance | Crystalline Solid |
| Melting Point (°C) | >2200 |
| Theoretical Density (g/cc) | 3.26 |
| Purity | 99.8% |
* If you need AlN sputtering targets of other purities, please contact us for customization.
Regular Size
| Diameter (inch) | Thick (inch) |
|---|---|
| 1.00 | 0.125 |
| 1.00 | 0.250 |
| 2.00 | 0.125 |
| 2.00 | 0.250 |
| 3.00 | 0.125 |
| 3.00 | 0.250 |
| 4.00 | 0.125 |
| 4.00 | 0.250 |
| 6.00 | 0.250 |
* Some of the AlN sputtering targets of the above sizes are in stock, and other sizes can be customized. Please send us an inquiry for more information.
Bonded Assemblies Specifications
| Material | Target Size | Purity | Bonding Type | Backing Plate Size |
|---|---|---|---|---|
| Aluminum Nitride | 1.00" Diameter × 0.125" Thick | 99.8% | Elastomer | 1.00" Diameter × 0.125" Thick |
| Aluminum Nitride | 2.00" Diameter × 0.125" Thick | 99.8% | Elastomer | 2.00" Diameter × 0.125" Thick |
| Aluminum Nitride | 2.00" Diameter × 0.125" Thick | 99.8% | Elastomer | 2.00" Diameter × 0.092" Thick |
| Aluminum Nitride | 3.00" Diameter × 0.125" Thick | 99.8% | Elastomer | 3.00" Diameter × 0.125" Thick |
| Aluminum Nitride | 4.00" Diameter × 0.125" Thick | 99.8% | Elastomer | 4.00" Diameter × 0.092" Thick |
Material Forms
In addition to round AlN sputtering targets, we also provide AlN sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
As high-performance ceramic targets, AlN sputtering targets can be used in the manufacture of the following devices and materials.
- Electronic devices such as LED devices
- Solar cells
- Optical devices
- Display devices
- Biological sensors
- Surface acoustic wave devices
- Heat-emitting devices
- High-temperature crucibles
- Metal matrix and polymer matrix composite materials
- High-temperature sealing adhesives
- Electronic packaging materials
- ...
Alfa Chemistry focuses on the R&D and production of sputtering targets. We provide AlN sputtering targets of various specifications, and we also support target customization. If you have any questions or needs, please do not hesitate to contact us.
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