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Ta Sputtering Targets

Ta Sputtering Targets

Alfa Chemistry provides high-quality tantalum (Ta) sputtering targets in different specifications. Ta sputtering targets have strong high temperature resistance, corrosion resistance and oxidation resistance, and are mainly used in semiconductor coating, optical coating and other industries. You can view detailed information about Ta sputtering targets below.

Basic Information

ItemsTa Sputtering Targets
CatalogACAM-ST-CM021
MaterialTantalum
SymbolTa
ColorGray Blue
Thermal Conductivity (W/m·K)57
Melting Point (°C)3017
Theoretical Density (g/cc)16.6
Coefficient Of Thermal Expansion6.3 x 10-6/K
Purity99.95%

* If you need Ta sputtering targets of other purities, please contact us for customization.

Regular Size

Diameter (inch)Thick (inch)
1.000.125
1.000.250
2.000.125
2.000.250
3.000.125
3.000.250
4.000.125
4.000.250
6.000.250
8.000.125
8.000.250

* Some of the Ta sputtering targets of the above sizes are in stock, and other sizes can be customized. Please send us an inquiry for more information.

Bonded Assemblies Specifications

MaterialTarget SizePurityBonding TypeBacking Plate Size
Tantalum2.00" Diameter × 0.125" Thick99.95%Elastomer2.00" Diameter × 0.125" Thick
Tantalum3.00" Diameter × 0.125" Thick99.95%Elastomer3.00" Diameter × 0.125" Thick
Tantalum4.00" Diameter × 0.125" Thick99.95%Elastomer4.00" Diameter × 0.125" Thick
Tantalum4.00" Diameter × 0.250" Thick99.95%Elastomer4.00" Diameter × 0.125" Thick

Material Forms

In addition to round Ta sputtering targets, we also provide Ta sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.

Alfa Chemistry specializes in the production of Ta sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.

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