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Mo Sputtering Targets

Mo Sputtering Targets

Alfa Chemistry provides different specifications of molybdenum (Mo) sputtering targets with high purity, high density, fine and uniform grains. These characteristics make the Mo sputtering target obtain extremely high sputtering efficiency, uniform film thickness and smooth etched surface during sputtering. Mo sputtering targets are mainly used for flat panel displays, electrodes of thin-film solar cells, wiring materials, and barrier layer materials of semiconductors. You can view detailed information about Mo sputtering targets below.

Basic Information

ItemsMo Sputtering Targets
CatalogACAM-ST-CM017
MaterialMolybdenum
SymbolMo
ColorGrey
Thermal Conductivity (W/m·K)139
Melting Point (°C)2617
Theoretical Density (g/cc)10.2
Coefficient Of Thermal Expansion4.8 x 10-6/K

Regular Size And Purity

SizePurity
1.00" Diameter × 0.125" Thick99.95%
1.00" Diameter × 0.250" Thick99.95%
2.00" Diameter × 0.125" Thick99.95%
2.00" Diameter × 0.250" Thick99.95%
3.00" Diameter × 0.125" Thick99.95%
3.00" Diameter × 0.250" Thick99.95%
4.00" Diameter × 0.125" Thick99.95%
4.00" Diameter × 0.250" Thick99.95%
6.00" Diameter × 0.125" Thick99.95%
6.00" Diameter × 0.250" Thick99.95%
8.00" Diameter × 0.125" Thick99.95%
8.00" Diameter × 0.250" Thick99.95%

* Some of the Mo sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.

Material Forms

In addition to round Mo sputtering targets, we also provide Mo sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.

Alfa Chemistry specializes in the production of Mo sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.

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