Ni Sputtering Targets
Alfa Chemistry provides nickel (Ni) sputtering targets in different specifications. Ni sputtering targets have good thermal and electrical conductivity, special electrical and magnetic properties, as well as excellent mechanical properties such as high strength and good ductility. They have a very homogeneous microstructure, which facilitates more uniform film deposition during the sputtering process, further improving the performance and reliability of the final product. In addition, Ni sputtering targets can be easily processed into required shapes and sizes through various machining techniques, which is especially important for applications with customized needs. You can view detailed information about Ni sputtering targets below.
Basic Information
| Items | Ni Sputtering Targets |
|---|---|
| Catalog | ACAM-ST-CM018 |
| Material | Nickel |
| Symbol | Ni |
| Color | Lustrous, Silvery Tinge |
| Thermal Conductivity (W/m·K) | 91 |
| Melting Point (°C) | 1453 |
| Theoretical Density (g/cc) | 8.91 |
| Coefficient Of Thermal Expansion | 13.4 x 10-6/K |
Regular Size And Purity
| Size | Purity |
|---|---|
| 1.00" Diameter × 0.063" Thick | 99.99% |
| 1.00" Diameter × 0.125" Thick | 99.9%, 99.99%, 99.995% |
| 1.50" Diameter × 0.0625" Thick | 99.99% |
| 2.00" Diameter × 0.063" Thick | 99.9%, 99.99% |
| 2.00" Diameter × 0.079" Thick | 99.99% |
| 2.00" Diameter × 0.08" Thick | 99.99% |
| 2.00" Diameter × 0.125" Thick | 99.9%, 99.99%, 99.995% |
| 2.00" Diameter × 0.250" Thick | 99.9%, 99.99%, 99.995% |
| 3.00" Diameter × 0.0625" Thick | 99.995% |
| 3.00" Diameter × 0.063" Thick | 99.9%, 99.99% |
| 3.00" Diameter × 0.125" Thick | 99.9%, 99.99%, 99.995% |
| 3.00" Diameter × 0.250" Thick | 99.9%, 99.99%, 99.995% |
| 4.00" Diameter × 0.063" Thick | 99.9%, 99.99% |
| 4.00" Diameter × 0.125" Thick | 99.9%, 99.99%, 99.995%% |
| 4.00" Diameter × 0.250" Thick | 99.9%, 99.99%, 99.995% |
| 5.00" Diameter × 0.250" Thick | 99.99% |
| 6.00" Diameter × 0.125" Thick | 99.9%, 99.98%, 99.99%, 99.995% |
| 6.00" Diameter × 0.250" Thick | 99.9%, 99.99%, 99.995% |
| 8.00" Diameter × 0.125" Thick | 99.9%, 99.97%, 99.99%, 99.995% |
| 8.00" Diameter × 0.250" Thick | 99.9%, 99.99%, 99.995% |
* Some of the Ni sputtering targets of the above sizes and purities are in stock, and other sizes and purities can be customized. Please send us an inquiry for more information.
Material Forms
In addition to round Ni sputtering targets, we also provide Ni sputtering targets in other forms, such as square targets, tube targets, arc targets and special-shaped targets.
Applications
Ni sputtering targets have a wide range of applications, including:
- Conductive layers for integrated circuits
- Magnetic materials
- Functional coatings
- Decorative coatings
- Fuel cells
- Sensors
- Scientific research
- ...
Alfa Chemistry specializes in the production of Ni sputtering targets with the highest possible density and highest possible purity. We'll help you choose the right target materials, manufacturing processes, bonded assemblies and backing plates. If you have any questions or needs, please do not hesitate to contact us.
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