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Niobium Target


Description

Niobium Target

As with good chemical resistance, niobium target has a wide range of applications. Alfa Chemistry produces niobium target by vacuum electron beam melting technology, including square and circular niobium target. We adopt the unique rolling technology to process which is more complex, and the annealing temperature and time of cooperate is more precise to guarantee the high-quality level of the target material.

Alfa Chemistry provides niobium target with uniform, high-density microstructure, and controlled texture, promoting uniform sputtering rates and generally superior sputtering behavior.

General Properties

ItemsNiobium Target
CatalogACAM-Nb-P006
MaterialR04200, R04210
Density8.57 g/cm3
Thermal Conductivity54 W/m.K
Coefficient of Thermal Expansion7.3 x 10-6/K
Surface roughnessRa 0.8-1.6
Flatness0.1mm or 0.1%
Purity99.9%, 99.95%, 99.99%, 99.995%
Recrystallization95% Min
Size Diameter 50~400mm (+/- 0.2mm) / Thickness 3~28mm
FormRound, Square
StandardASTM B393-05

Chemical Component

ElementsNbFeNiCrCuZrPSiTaWMo
ContentRemainder30 Max25 Max5 Max5 Max50 Max30 Max30 Max600 Max50 Max50 Max
ElementsNaLiKUThHCONOthers
Content3 Max5 Max3 Max0.1 Max0.1 Max15 Max40 Max130 Max20 Max10 Max

* Unit: ppm

Size and Tolerance

We supply round and rectangular plate niobium target. Below are most of the standard sizes for our targets. If you do not see the size that you need, please feel free to contact us.

  • Round Target Sizes/Tolerance (mm.max)
ThicknessToleranceDiameterTolerance
GradeⅠGradeⅠI
3-8±0.1±0.250-450±0.2
8-14±0.1±0.250-450±0.2
≥ 14±0.1±0.250-400±0.2
  • Rectangular Target Sizes/Tolerance (mm.max)
ThicknessToleranceWidthToleranceLengthTolerance
GradeⅠGradeⅠI
3-8±0.1±0.250-400±0.250-1800±0.2
8-14±0.1±0.250-350±0.250-1500±0.2
≥ 14±0.1±0.250-300±0.250-1200±0.2

Applications

Niobium target can find applications in many other areas including:

  • Semiconductor
  • Optical application
  • Chemical vapor deposition
  • Physical vapor deposition